Self-aligned III-V MOSFET fabrication with in-situ III-V epitaxy and in-situ metal epitaxy and contact formation

ABSTRACT

A method for forming a transistor includes providing a patterned gate stack disposed on a III-V substrate and having sidewall spacers formed on sides of the patterned gate stack, the III-V substrate including source/drain regions adjacent to the sidewall spacers and field oxide regions formed adjacent to the source/drain regions. The method includes growing raised source/drain regions on the source/drain regions, the grown raised source/drain regions including III-V semiconductor material, and growing metal contacts on the grown raised source/drain regions. Another method for forming a transistor includes providing a patterned gate stack disposed on a III-V substrate and having sidewall spacers formed on sides of the patterned gate stack, the III-V substrate including source/drain regions adjacent to the sidewall spacers and field oxide regions formed adjacent to the source/drain regions. The method includes growing metal contacts on the source/drain regions. Transistors and computer program products are also disclosed.

BACKGROUND

This invention relates generally to III-V semiconductors and, morespecifically, relates to contacts and MOSFETs formed on III-Vsemiconductors.

Self-aligned integration of III-V metal-oxide-semiconductor field effecttransistor (MOSFET) is either challenging or complicated. In typicalsilicon-based semiconductor processing, there is a self-aligned silicideprocess, which is a process of forming a surface layer of metal silicideon a silicon substrate. Additionally, in III-V processing, there is asimilar process (called germinide) to achieve self-aligned integration.Typically, germinide involves the selective growth of germanium at III-Vsource/drain regions, followed by subsequent formation of Ni—Ge alloysfor contacts. Nevertheless, the challenges of this process include thehigh resistance of grown germanium layers and the high contactresistance between Ni—Ge alloy and the grown germanium.

Thus, there are few options in current III-V semiconductor processingfor forming contacts on III-V semiconductors.

SUMMARY

In an exemplary embodiment, a method for forming a transistor isdisclosed that includes providing a patterned gate stack disposed on aIII-V substrate and having sidewall spacers formed on sides of thepatterned gate stack, the III-V substrate including source/drain regionsadjacent to the sidewall spacers and field oxide regions formed adjacentto the source/drain regions. The method includes growing raisedsource/drain regions on the source/drain regions, the grown raisedsource/drain regions including III-V semiconductor material, and growingmetal contacts on the grown raised source/drain regions.

In another exemplary embodiment, another method for forming a transistoris disclosed that includes providing a patterned gate stack disposed ona III-V substrate and having sidewall spacers formed on sides of thepatterned gate stack, the III-V substrate including source/drain regionsadjacent to the sidewall spacers and field oxide regions formed adjacentto the source/drain regions. The method includes growing metal contactson the source/drain regions.

In a further exemplary embodiment, a transistor is disclosed thatincludes a III-V substrate, and a patterned gate stack disposed on theIII-V substrate. The pattern gate stack has sidewall spacers formed onsides of the patterned gate stack. The III-V substrate includessource/drain regions adjacent to the sidewall spacers and field oxideregions formed adjacent to the source/drain regions. The transistorincludes raised source/drain regions on the source/drain regions, theraised source/drain regions comprised of III-V semiconductor material.The transistor also includes metal contacts on the raised source/drainregions.

In another exemplary embodiment, a computer program product is disclosedthat includes a computer readable storage medium having computerreadable program code embodied therewith, the computer readable programcode configured to cause one or more semiconductor processing apparatusto perform at least the following: on a provided semiconductor includinga III-V substrate having a patterned gate stack disposed on the III-Vsubstrate and having sidewall spacers formed on sides of the patternedgate stack, the III-V substrate comprising source/drain regions adjacentto the sidewall spacers and field oxide regions formed adjacent to thesource/drain regions, growing raised source/drain regions on thesource/drain regions, the grown raised source/drain regions includingIII-V semiconductor material; and growing metal contacts on the grownraised source/drain regions.

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS

FIG. 1 is an enlarged cross-sectional view of a III-V semiconductorstructure (e.g., a MOSFET) after source/drain implantation.

FIG. 2 is an enlarged cross-sectional view of the III-V semiconductorstructure (e.g., a MOSFET) of FIG. 1 after selective growth of raisedsource/drain regions on the GaAs substrate.

FIG. 3 is an enlarged cross-sectional view of the III-V semiconductorstructure (e.g., a MOSFET) of FIG. 2 after selective growth of metalcontacts on the raised source/drain regions.

FIG. 4 is an enlarged cross-sectional view of the III-V semiconductorstructure (e.g., a MOSFET) of FIG. 1 after selective growth of metalcontacts on the source/drain regions.

FIG. 5 is a block diagram of an exemplary system for performingsemiconductor processing in accordance with exemplary embodimentsherein.

DETAILED DESCRIPTION

As described above, there are few options in III-V semiconductorprocessing for forming contacts on III-V semiconductors. Exemplaryembodiments herein propose techniques and resultant structures forself-aligned metal contacts, such as aluminum (Al) metal contacts,formed on III-V semiconductors. In particular, techniques are disclosedfor forming self-aligned metal contacts on n+ GaAs source/drain regionsof a MOSFET.

Turning now to FIG. 1, an enlarged cross-sectional view is shown of aIII-V semiconductor structure 105 (e.g., a MOSFET) after source/drainimplantation. MOSFET 105 resides on part of a III-V semiconductor 100.Semiconductor 100 includes a gallium arsenide (GaAs) substrate 110 andinsulating regions 120 (e.g., to isolate MOSFET 105 from other MOSFETsor other devices). The insulating regions 120 are comprised of, e.g.,silicon nitride, silicon oxide and alumina, which can be made by, in anexemplary embodiment, chemical vapor deposition (CVD) and atomic layerdeposition (ALD). Prior to source/drain implantation, a gate stack isformed by forming an underlying layer of gate dielectric 150 and anoverlying layer of gate metal 140. The typical gate dielectric issilicon nitride, silicon oxide, alumina, or hafnium oxide form by eitherCVD or ALD. The thickness range of the gate dielectric is 0.1 nm-20 nm.The layers 140, 150 are patterned via known techniques (e.g., etching)to form the patterned gate stack 107. The sidewall spacers 160 areformed by deposition of a layer silicon nitride or silicon oxide suchthat the layer is formed on the sidewalls 161 of the patterned gatestack 107. The layer is then selectively etched so that the sidewallspacers 160 have a thickness in the range of 1 nm-100 nm.

The MOSFET 105 includes the source/drain regions 130 that are in thisexample implantation regions. The source/drain implantation regions 130can be created using either n+ implantation or p+ implantation,depending on whether an N-MOSFET or P-MOSFET, respectively, is beingmade. The common elements for n+ implantation are Si, Ge, S, Se, and Te,while those for p+ implantations are C (carbon), Mg, Be, and Zn. Thesesource/drain implantation regions 130 may be formed, e.g., via ionimplantation and an activation anneal. It is also noted that the regions130 may be source/drain regions formed via other techniques, such asdiffusion.

Turning now to FIG. 2, an enlarged cross-sectional view of the MOSFET105 of FIG. 1 is shown after selective growth in a chemical vapordeposition (CVD) tool of GaAs raised source/drain regions 170 on theGaAs substrate. In an example, GaAs raised source/drain regions 170 aredoped n+ and may be formed using techniques described in, e.g., Kanberet al., “Optimization of Selective Area Growth of GaAs by Low PressureOrganometallic Vapor Phase Epitaxy for Monolithic Integrated Circuits”,Journal of Electronic Materials, Vol. 23, No. 2 (1994). In Kanber, theyused masks of SiO₂ or Si_(x)N_(y) to provide selective growth ofSi-doped GaAs (or undoped GaAs). In FIG. 2, however, the sidewallspacers 160 and the field oxide 120 provide selectivity to the growth ofthe n+ GaAs raised source/drain regions 170. That is, the materials inthe sidewall spacers 160, the gate metal 140, and the field oxide 120are not susceptible to growth of GaAs, while the GaAs in thesource/drain regions 130 (e.g., at the surface 131) are susceptible togrowth of GaAs.

As described in Kanber, the n+ GaAs raised source-drain regions may bedoped using a dopant source, silane (SiH₄) (e.g., 2000 parts permillion, ppm at a flow rate of 7 sccm, standard cubic centimeters perminute), while growing GaAs using a III-V semiconductor material sourcesuch as AsH₃ or tributylarsene (TBA) in a reactor having a pressure of15 Torr with a substrate temperature of about 720 C. Hydrogen (H₂) maybe used as a carrier gas at eight slm (standard liters per minute) and aflow rate of AsH₃ between 50 and 150 sccm. For a p+ implantation, onemay replace the silane with, e.g., dimethylzinc. The growing process maybe performed from 10 seconds (s) to 1000 s, to create raisedsource/drain region thicknesses from 10 nm-100 nm.

It is noted that after selectively growing the n+ GaAs raisedsource/drain regions on the GaAs substrate 110, thermal annealing may beperformed, e.g., to clean the surface of n+ GaAs before growing metalcontacts such as Al. Nevertheless, this operation can be performed inthe same CVD tool (i.e., reactor) as used to selectively grow the raisedsource/drains 170 without breaking the vacuum.

Referring now to FIG. 3, an enlarged cross-sectional view is shown ofthe MOSFET 105 of FIG. 2 after selective growth of metal contacts 180 onthe n+ GaAs raised source/drain regions 170. It is noted that selectivegrowth of metal contacts 180 can be performed in the same CVD tool(i.e., reactor) as used to selectively grow the raised source/drains 170without breaking the vacuum. The contacts 180 are formed from selectivegrowth of contact metal on the raised source/drain regions 170. Theselectivity occurs because, e.g., the structures (e.g., gate metal 140,sidewall spacers 160, field oxides 120) surrounding the raisedsource/drain 170 are not susceptible to growth of the contact metalwhereas the material (e.g., n+ or p+ GaAs) in the raised source/drainregions are susceptible to growth of the contact metal. It should benoted that, in principle, the epitaxial growth rate is sensitive to thecrystal orientation of the substrate. Therefore, the growth of Al isexpected to be negligible on the sides 171 of the regions 170. However,there may be some growth of Al on the sides 171 of the regions 170.

As an example, in order to selectively grow Al contacts 180 on the n+GaAs raised source/drain regions 170, the semiconductor 100 is subjected(i.e., in the same CVD reactor used to selectively grow the raisedsource/drains 170) to an appropriate temperature range (of thesemiconductor 100) of 150 C-360 C. The precursor selected may be, e.g.,dimethyl-ethyl amine alane (DMEAA). The carrier gas can be H₂ or N₂. Therange of the reactor pressure is 0.001 mbar to 100 mbar (e.g., about 50mbar). The range of the flow rate of DMEAA is about 0.1 to about 100μmole/min (micro-mole per minute). The range of Al deposition rate isabout 0.1 to about 100 nanometers (nm)/min. The range of contactthicknesses is 1 nm to 300 nm.

The remainder of the MOSFET process flow may be conventional for III-Vprocessing. For instance, an additional thermal annealing step may beused to further reduce the contact resistance. Nevertheless, this stepis optional and may not be necessary for the process flow.

Optionally, the metal contacts 180 may be selectively grown directly onthe source/drain implantation regions 130. FIG. 4 is an enlargedcross-sectional view of the MOSFET 105 of FIG. 1 after selective growthof metal contacts on the source/drain implantation regions 130. Thetechniques described above in reference to FIG. 3 may be used to formthe metal contacts 180 on the source/drain implantation regions 130. Itshould be noted that the raised source/drain regions 170 help to reducethe resistance of the MOSFET 105.

Although the substrate 110 has been described as being GaAs, thereshould be equivalent processes for InGaAs, GaSb, and InP. This isbecause InGaAs, GaSb, and InP have the same crystal structure as GaAsand therefore, they will have similar material properties in terms ofselective growth.

Integrated circuit chips resulting from the techniques described hereincan be distributed by the fabricator in raw wafer form (that is, as asingle wafer that has multiple unpackaged chips), as a bare die, or in apackaged form. In the latter case the chip is mounted in a single chippackage (such as a plastic carrier, with leads that are affixed to amotherboard or other higher level carrier) or in a multichip package(such as a ceramic carrier that has either or both surfaceinterconnections or buried interconnections). In any case the chip isthen integrated with other chips, discrete circuit elements, and/orother signal processing devices as part of either (a) an intermediateproduct, such as a motherboard, or (b) an end product. The end productcan be any product that includes integrated circuit chips, ranging fromtoys and other low-end applications to advanced computer products havinga display, a keyboard or other input device, and a central processor.

Furthermore, aspects of the present invention may take the form of acomputer program product embodied in one or more computer readablemedium(s) having computer readable program code embodied thereon. Anycombination of one or more computer readable medium(s) may be utilized.The computer readable medium may be a computer readable signal medium ora computer readable storage medium. A computer readable storage mediummay be, for example, but not limited to, an electronic, magnetic,optical, electromagnetic, infrared, or semiconductor system, apparatus,or device, or any suitable combination of the foregoing. More specificexamples (a non-exhaustive list) of the computer readable storage mediumwould include the following: an electrical connection having one or morewires, a portable computer diskette, a hard disk, a random access memory(RAM), a read-only memory (ROM), an erasable programmable read-onlymemory (EPROM or Flash memory), an optical fiber, a portable compactdisc read-only memory (CD-ROM), an optical storage device, a magneticstorage device, or any suitable combination of the foregoing. In thecontext of this document, a computer readable storage medium may be anytangible medium that can contain, or store a program for use by or inconnection with an instruction execution system, apparatus, or device.

A computer readable signal medium may include a propagated data signalwith computer readable program code embodied therein, for example, inbaseband or as part of a carrier wave. Such a propagated signal may takeany of a variety of forms, including, but not limited to,electro-magnetic, optical, or any suitable combination thereof. Acomputer readable signal medium may be any computer readable medium thatis not a computer readable storage medium and that can communicate,propagate, or transport a program for use by or in connection with aninstruction execution system, apparatus, or device. Program codeembodied on a computer readable medium may be transmitted using anyappropriate medium, including but not limited to wireless, wireline,optical fiber cable, RF, etc., or any suitable combination of theforegoing.

Computer program code for carrying out operations for aspects of theinstant invention may be written in any combination of one or moreprogramming languages, including an object oriented programming languagesuch as JAVA (a programming language), Smalltalk, C++ or the like andconventional procedural programming languages, such as the “C”programming language or similar programming languages. The program codemay execute entirely on the user's computer, partly on the user'scomputer, as a stand-alone software package, partly on the user'scomputer and partly on a remote computer or entirely on the remotecomputer or server. In the latter scenario, the remote computer may beconnected to the user's computer through any type of network, includinga local area network (LAN) or a wide area network (WAN), or theconnection may be made to an external computer (for example, through theInternet using an Internet Service Provider).

Aspects of the present invention are described above with reference tosemiconductor processing operations according to embodiments of theinvention. It will be understood that the operations can be implementedby computer program instructions. These computer program instructionsmay be provided to a processor of a general purpose computer, specialpurpose computer, or other programmable data processing apparatus toproduce a machine, such that the instructions, which execute via theprocessor of the computer or other programmable data processingapparatus, create means for implementing the functions/acts specified inthe flowchart and/or block diagram block or blocks.

For instance, an exemplary system 500 suitable for performing theprocessing shown in FIGS. 1-4 (and additional processing if desired) isshown in FIG. 5. In FIG. 5, one or more control systems 520 (e.g.,computers) comprise one or more processors 525 coupled to one or morememories 530 via one or more networks (e.g., buses) 540. The one or morecontrol systems 520 are coupled via one or more networks 550 tosemiconductor processing apparatus 510 such as a reactor 510-1 (e.g.,CVD tool), gas flow controllers 510-2 (e.g., if separate from thereactor 510-1) and semiconductor movement devices 510-3 (e.g., waferpositioning and movement systems). The one or more memories 530 comprisecomputer readable program code suitable for causing the semiconductorprocessing apparatus 510 to perform operations such as the operationsshown in FIGS. 1-4.

The one or more control systems 520 may also manipulate the inputs 560to the semiconductor processing apparatus 510. Such inputs 560 mayinclude, e.g., semiconductor movement control parameters 560-1 (e.g., atwhat time a wafer should be moved, where the wafer should be placed),temperature parameters 560-2 (e.g., temperature of the wafer,potentially with ramp up or down rates), pressure parameters 560-3(e.g., of the interior of the reactor 510-1), precursor gas parameters560-4 (e.g., flow rates for particular precursors, which precursor gasshould be used and for how long), dopant gas parameters 560-5 (e.g.,flow rates for particular dopant gases, which dopant gas should be usedand for how long), carrier gas parameters 560-6 (e.g., flow rates, whichcarrier gas should be used and for how long), and time parameters 560-7(e.g., how long the reactor should process wafers at particulartemperatures). It should be noted that a semiconductor processingapparatus 510 may include a corresponding control system 520 to createan integral semiconductor processing apparatus 590. For instance, an“integral” reactor 590 may have a corresponding control system 520attached to a reactor 510-2. The control system 520 in such a case maybe networked via one or more networks 550 to enable the control system520 to be loaded with the computer readable program code 535.

These computer program instructions may also be stored in a computerreadable medium that can direct a computer, other programmable dataprocessing apparatus, or other devices to function in a particularmanner, such that the instructions stored in the computer readablemedium produce an article of manufacture including instructions whichimplement the function/act specified in the flowchart and/or blockdiagram block or blocks.

The terminology used herein is for the purpose of describing particularembodiments only and is not intended to be limiting of the invention. Asused herein, the singular forms “a”, “an” and “the” are intended toinclude the plural forms as well, unless the context clearly indicatesotherwise. It will be further understood that the terms “comprises”and/or “comprising,” when used in this specification, specify thepresence of stated features, integers, steps, operations, elements,and/or components, but do not preclude the presence or addition of oneor more other features, integers, steps, operations, elements,components, and/or groups thereof.

The corresponding structures, materials, acts, and equivalents of allmeans or step plus function elements in the claims below are intended toinclude any structure, material, or act for performing the function incombination with other claimed elements as specifically claimed. Thedescription of the present invention has been presented for purposes ofillustration and description, but is not intended to be exhaustive orlimited to the invention in the form disclosed. Many modifications andvariations will be apparent to those of ordinary skill in the artwithout departing from the scope and spirit of the invention. Theembodiment was chosen and described in order to best explain theprinciples of the invention and the practical application, and to enableothers of ordinary skill in the art to understand the invention forvarious embodiments with various modifications as are suited to theparticular use contemplated.

1. A method for forming a transistor, comprising: providing a patternedgate stack disposed on a III-V substrate and having sidewall spacersformed on sides of the patterned gate stack, the III-V substratecomprising source/drain regions adjacent to the sidewall spacers andfield oxide regions formed adjacent to the source/drain regions; growingraised source/drain regions on the source/drain regions, the grownraised source/drain regions comprised of III-V semiconductor material;and growing metal contacts on the grown raised source/drain regions. 2.The method of claim 1, further comprising forming the source/drainregions at least by implanting a dopant into the III-V substrate.
 3. Themethod of claim 2, wherein the dopant comprises one or more of Si, Ge,S, Se, and Te for n implantation and one or more of C, Mg, Be, and Znfor p implantation.
 4. The method of claim 1, wherein growing raisedsource/drain regions on the source/drain regions further comprisesproviding a carrier gas carrying a III-V material source and a dopantsource in a reactor at a predetermined pressure while the III-Vsubstrate has a predetermined temperature.
 5. The method of claim 4,further comprising performing thermal annealing of the III-IV substratein the reactor without breaking vacuum in the reactor.
 6. The method ofclaim 4, wherein the III-V material source comprises one or more of AsH₃or tributylarsene.
 7. The method of claim 1, wherein growing metalcontacts further comprises providing a carrier gas carrying a precursorin a reactor at a predetermined pressure while the III-V substrate has apredetermined temperature.
 8. The method of claim 7, wherein theprecursor comprises dimethyl-ethyl amine alane (DMEAA) and thepredetermined temperature is between 150 Centigrade (C)-360 C.
 9. Themethod of claim 8, wherein pressure of the reactor is between 0.001millibar (mbar) to 100 mbar and a flow rate of the DMEAA is between 0.1to 100 micro-mole per minute.
 10. The method of claim 1, wherein:growing raised source/drain regions on the source/drain regions furthercomprises providing a first carrier gas carrying a III-V material sourceand a dopant source in a reactor at a first predetermined pressure whilethe III-V substrate has a first predetermined temperature; and growingraised source/drain regions on the source/drain regions furthercomprises, without breaking vacuum in the reactor after growing theraised source/drain regions, providing a second carrier gas carrying aIII-V material source and a dopant source in the reactor at a secondpredetermined pressure while the III-V substrate has a secondpredetermined temperature.
 11. The method of claim 1, wherein the III-Vsubstrate comprises one or more of GaAs, InGaAs, GaSb, or InP.
 12. Themethod of claim 1, used in the fabrication of integrated circuit chips.13. A method for forming a transistor, comprising: providing a patternedgate stack disposed on a III-V substrate and having sidewall spacersformed on sides of the patterned gate stack, the III-V substratecomprising source/drain regions adjacent to the sidewall spacers andfield oxide regions formed adjacent to the source/drain regions; growingmetal contacts on the source/drain regions.
 14. The method of claim 13,further comprising forming the source/drain regions at least byimplanting a dopant into the III-V substrate.
 15. The method of claim14, wherein the dopant comprises one or more of Si, Ge, S, Se, and Tefor n implantation and one or more of C, Mg, Be, and Zn for pimplantation.
 16. The method of claim 13, further comprising performingthermal annealing of the III-IV substrate prior to the growing of themetal contacts.
 17. The method of claim 13, wherein growing metalcontacts further comprises providing a carrier gas carrying a precursorin a reactor at a predetermined pressure while the III-V substrate has apredetermined temperature.
 18. The method of claim 17, wherein theprecursor comprises dimethyl-ethyl amine alane (DMEAA) and thepredetermined temperature is between 150 Centigrade (C)-360 C.
 19. Themethod of claim 18, wherein pressure of the reactor is between 0.001millibar (mbar) to 100 mbar and a flow rate of the DMEAA is between 0.1to 100 micro-mole per minute.
 20. The method of claim 13, wherein theIII-V substrate comprises one or more of GaAs, InGaAs, GaSb, or InP. 21.The method of claim 13, used in the fabrication of integrated circuitchips.
 22. A transistor, comprising: a III-V substrate; a patterned gatestack disposed on the III-V substrate and having sidewall spacers formedon sides of the patterned gate stack, the III-V substrate comprisingsource/drain regions adjacent to the sidewall spacers and field oxideregions formed adjacent to the source/drain regions; raised source/drainregions on the source/drain regions, the raised source/drain regionscomprised of III-V semiconductor material; and metal contacts on theraised source/drain regions.
 23. The transistor of claim 22, wherein themetal contacts comprise aluminum.
 24. A computer program product,comprising: a computer readable storage medium having computer readableprogram code embodied therewith, the computer readable program codeconfigured to cause one or more semiconductor processing apparatus toperform at least the following: on a provided semiconductor comprising aIII-V substrate having a patterned gate stack disposed on the III-Vsubstrate and having sidewall spacers formed on sides of the patternedgate stack, the III-V substrate comprising source/drain regions adjacentto the sidewall spacers and field oxide regions formed adjacent to thesource/drain regions, growing raised source/drain regions on thesource/drain regions, the grown raised source/drain regions comprised ofIII-V semiconductor material; and growing metal contacts on the grownraised source/drain regions.